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MAPPER Lithography B.V. company has developed specialized lithography equipment used in semiconductor production. (MAPPER stands for "Multi-Aperture Pixel-by-Pixel Enhancement of Resolution," which is the name of the company's proprietary technology.) Lithography is a key process by which circuit patterns are inscribed into silicon wafers. The company has technology partnerships with Philips and Taiwan Semiconductor Manufacturing. The MAPPER technology grew out of research at the Delft University of Technology, and the company, established in 2000, makes its headquarters in the university's Applied Physics Laboratory.

Mattson Technology, Inc. was founded in 1988 and is headquartered in Fremont, California. Mattson Technology, Inc. (Mattson) is engaged in designing, manufacturing and marketing semiconductor wafer processing equipment used in the fabrication of integrated circuits (ICs or chips). Mattson is a supplier of dry strip and rapid thermal processing equipment to the global semiconductor industry. The Company’s customer base includes foundries, memory and logic device manufacturers. The Company has design and manufacturing centers in the United States, Canada and Germany. Mattson’s manufacturing equipment is used for transistor level, or front-end-of-line manufacturing, and also in specialized applications for processing the interconnect layer, or back-end-of-line processing. A strip system removes photoresist or other residues from a wafer following each step of film deposition or diffusion processing in preparation for the next processing step. Methods for stripping off these residues include wet and dry technologies.

Metara Inc. was founded in 2000 and is headquartered in Sunnyvale, California. Metara Inc. manufactures chemical metrology tools for semiconductor industry that are used in monitoring and controlling chemical processes. Its products include sentry trace contamination metrology system, which monitors benign chemistries for trace contaminants; and sentry chemical composition metrology system, which monitors copper electroplating and cobalt bath chemistries. The company also offers sentry harsh chemistry metrology system, an analysis solution for harsh chemistries used in semiconductor manufacturing processes; and inline mass spectrometer, a chemical metrology solution that determines chemical composition and potential yield-or process-limiting contaminants.

Micronic Laser Systems AB engages in the development, manufacture, and marketing of a series of laser pattern generators for the production of photo-masks, a principal component of the microlithography process in Sweden. Its product line includes semiconductor, display, and electronic packaging products. In the semiconductor market, the company operates as a supplier that offers the market a whole new technology for producing semiconductor chips. Markets The primary markets for the company’s laser pattern generators are the display and semiconductor industries; and Multi Purpose systems. The company’s major geographic markets include China, Taiwan, South Korea, the U.S. and Japan. Products The Company manufactures systems that are used in the production of advanced photo-masks for flat panel displays (the lrs product series), semiconductor applications (the Sigma and Omega product series), and electronic packaging (the mp product series). The product offering also includes metrology systems for display photo-masks (the mms product series). Pattern generators for display photo-masks LRS series All of the systems in the LRS series are used to produce advanced photo-masks for flat panel displays, primarily for the manufacture of tft-lcds. The LRS - 11000-tft3 provides twice the resolution of Micronic’s earlier generation tft pattern generator, the LRS11000- tft2. The lrs11000-tft2 is also used for tft-lcd and color filter photomasks. The LRS15000 series has a larger stage, 1,300 x 1,500 mm, which is approximately sufficient for generation 7 tft-lcd photo-masks. The lrs15000- tft2 is used primarily to produce photo-masks for lcd-tvs, while the lrs15000-tft3 is designed for the most advanced tft-lcd photo-masks. Metrology systems for TFT-LCD photo-masks MMS15000 The MMS15000 system is used to verify pattern placement accuracy on area tft-lcd photo-masks. The system has a registration measurement accuracy of better than 100 nanometers and is capable of performing measurements on photo-masks as 1,300 x 1,500 mm. Pattern generators for semiconductor photo-masks Sigma7300 The Sigma7300 is a duv (Deep Ultra Violet) optical pattern generator based on spatial light modulator (slm) technology, and offers a combination of high resolution and short write time.

Micropac Industries, Inc. company was founded in 1963 and is based in Garland, Texas. Micropac Industries, Inc. manufactures and distributes various types of hybrid microelectronic circuits, solid state relays, power operational amplifiers, and optoelectronic components and assemblies. The Company's products are used as components in a range of military, space and industrial systems, including aircraft instrumentation and navigation systems, power supplies, electronic controls, computers, medical devices, and high-temperature (200 degree centigrade) products. The Company’s products are either custom (being application specific circuits designed and manufactured to meet the particular requirements of a single customer) or standard components, such as catalog items. The Company's products are marketed throughout the United States and in Western Europe, through a direct technical sales staff, independent representatives and independent stocking distributors.

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